This book is an attempt to provide a systematic and accessible presentation of the practical lore of electro-optical instrument design and construction--to be the book I needed as a graduate student."
--From the Preface
The details of the junctions and fabrication procedures are here.
Scaling performance on this small cluster is excellent, with less than 30% deviation from linear scaling of the single-machine version, due primarily to communications latency over the 1 Gb/s Ethernet connections. The reason for the speed appears to be that my code precomputes a strategy, which allows a very clean inner loop, whereas TEMPEST has a big switch statement inside its inner loop, which makes optimization and caching much more difficult.
Open sourcing is still in the plan but faces some organizational friction: please e-mail me if you'd like to try POEMS.
Particles in plasma etch chambers are a major source of yield loss
in semiconductor manufacturing. Particles condensing from
the plasma or spalling out of films on the chamber walls are
levitated in the edges of the plasma sheath for long periods, and
then (too often) drop on the wafer when the plasma excitation is
turned off.